VLSI Technology - ELEC9704
Faculty: Faculty of Engineering
School: School of Electrical Eng and Telecommunications
Course Outline: http://www.ee.unsw.edu.au
Campus: Kensington Campus
Career: Postgraduate
Units of Credit: 6
EFTSL: 0.12500 (more info)
Indicative Contact Hours per Week: 3
Excluded: ELEC9502
CSS Contribution Charge: 2 (more info)
Tuition Fee: See Tuition Fee Schedule
Further Information: See Class Timetable
View course information for previous years.
Description
UOC6 HPW3
Introduction to silicon VLSI technology. Future trends in VLSI technology. Technology limitations. Basic technology modules include: crystal growth and wafer preparation; mask generation techniques; lithography; diffusion process; ion implantation; oxidation; etching techniques - wet etching and plasma etching; thin film deposition - epitaxial growth, chemical vapor deposition techniques, metallisation; clean room technology; Advanced process integration for CMOS, BiCMOS and Bipolar fabrication; Failure analysis techniques.
Introduction to silicon VLSI technology. Future trends in VLSI technology. Technology limitations. Basic technology modules include: crystal growth and wafer preparation; mask generation techniques; lithography; diffusion process; ion implantation; oxidation; etching techniques - wet etching and plasma etching; thin film deposition - epitaxial growth, chemical vapor deposition techniques, metallisation; clean room technology; Advanced process integration for CMOS, BiCMOS and Bipolar fabrication; Failure analysis techniques.
Study Levels
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