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VLSI Technology - ELEC9704
ELEC9704

 
Faculty: Faculty of Engineering
 
 
School:  School of Electrical Eng and Telecommunications
 
 
Course Outline: http://www.ee.unsw.edu.au
 
 
Campus: Kensington Campus
 
 
Career: Postgraduate
 
 
Units of Credit: 6
 
 
EFTSL: 0.12500 (more info)
 
 
Indicative Contact Hours per Week: 3
 
 
Excluded: ELEC9502
 
 
CSS Contribution Charge:Band 2 (more info)
 
 
Tuition Fee:See Tuition Fee Schedule
 
 
Further Information: See Class Timetable
 
 

Description

UOC6 HPW3
Introduction to silicon VLSI technology. Future trends in VLSI technology. Technology limitations. Basic technology modules include: crystal growth and wafer preparation; mask generation techniques; lithography; diffusion process; ion implantation; oxidation; etching techniques - wet etching and plasma etching; thin film deposition - epitaxial growth, chemical vapor deposition techniques, metallisation; clean room technology; Advanced process integration for CMOS, BiCMOS and Bipolar fabrication; Failure analysis techniques.

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© The University of New South Wales (CRICOS Provider No.: 00098G), 2004-2011. The information contained in this Handbook is indicative only. While every effort is made to keep this information up-to-date, the University reserves the right to discontinue or vary arrangements, programs and courses at any time without notice and at its discretion. While the University will try to avoid or minimise any inconvenience, changes may also be made to programs, courses and staff after enrolment. The University may also set limits on the number of students in a course.