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Campus: Kensington Campus
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Career: Postgraduate
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Units of Credit: 6
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Contact Hours per Week: 3
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Description
Introduction to silicon VLSI technology. Future trends in VLSI technology. Technology limitations. Basic technology modules include: crystal growth and wafer preparation; mask generation techniques; lithography; diffusion process; ion implantation; oxidation; etching techniques - wet etching and plasma etching; thin film deposition - epitaxial growth, chemical vapor deposition techniques, metallisation; clean room technology; Advanced process integration for CMOS, BiCMOS and Bipolar fabrication; Failure analysis techniques.
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